What are the gasses used for Plasma Nitriding?

N₂ forms nitride compounds. H₂ reduces oxides and activates the surface. Ar stabilizes plasma and enhances sputtering. CH₄ provides carbon for FNC.

• N₂: primary ion source

• H₂: surface activation and reduction

• Ar: stabilizes discharge, enhances sputtering

• CH₄: carbon donor for FNC

In this infographic: how gases ensure reproducible, controlled nitriding.